Characterization of TiN films alternately treated with PVD and Cr ion implantation

Abstract

The projected ranges of the conventional ion implantation are generally below submicrons. This makes it difficult to apply the implantation techniques to the tribological uses. The combined process of the physical vapor deposition (PVD) and the ion implantation was developed to form the thick implanted layers over a few microns. In this process, firstly, the PVD films are deposited by the cathodic arc ion plating method with a film thickness of 50 to 250 nm. Secondly, the metal ions are implanted using the pulsed arc ion source at an energy below 80 keV without mass separation. These two processes were alternately conducted up to the film thickness of a few microns. Using this combined process, Cr implanted PVD-TiN films were studied. The film thicknesses of the implanted layers were 2–7 μm, which are over ten times larger than those of conventionally implanted layers. Furthermore, these films showed excellent wear resistances compared with the unimplanted PVD-TiN films.