Abstract
In this paper, the results of applying Proton Induced X-ray Emission (PIXE) and Rutherford Backscattering Spectroscopy (RBS) in order to determine the compositions of TiO 2 thin films prepared by Ion Beam Assisted Sputter Deposition (IBASD), are presented. The PIXE analysis of the oxide films determined, with high precision, the incorporation of impurities and the variation of the ratio of the constituent elements, possible as a result of preferential sputtering, due to ion beam irradiation. The results of the present investigation showed that the PIXE analysis combined with RBS can be effectively used for qualitative and quantitative analysis of thin film on the surface and in the film-substrate interface.
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