Abstract
Adsorption and retention of molecular contaminants on nanoparticles (NPs) is a major factor in determining the environmental and health effects of the particles. A method has been developed for characterizing the surface properties that contribute to the adsorption and desorption interactions. This method uses a sample cell and an in-situ FTIR to obtain the time profiles of dynamic interactions of adsorbing species on NP samples. The results are then analyzed using a process simulator to determine the fundamental properties such as capacity, affinity, rate expressions, and activation energies of NP interactions with contaminants. The method is illustrated using moisture as a representative model compound and particles of SiO 2, HfO 2, and CeO 2, which are three oxides used in semiconductor manufacturing. The results indicate that the surface interaction parameters are both species and particle size dependent. SiO 2 has the highest adsorption capacity and therefore most prone to the adsorption of moisture and similar contaminants. However, the affinity of the NPs for H 2O retention is highest for CeO 2 and lowest for SiO 2. Factors contributing to the environmental and health impact of NPs (extent of surface coverage, capacity, activation energy of retention) are higher for smaller particles of the same oxide.
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