Abstract
Porous anodic aluminum oxide (AAO) is deposited on a 5 cm × 5 cm tin-doped indium oxide (ITO)/glass substrate, and the AAO/ITO/glass structure thus formed is used to reduce the amount of unreacted Al inside the AAO template, thereby reducing the transmittance of the AAO/glass structure. The enhancement of transmittance is achieved by modulating the diameter of the pores and varying the applied bias. The proposed AAO can be used at a high applied bias (up to 120 V) to improve the uniformity of the current density. Following pore-widening treatment and posttreatment annealing, the morphologies and transmittance of the AAO/ITO/glass structure were also investigated.
Highlights
Nanoporous anodic aluminum oxide (AAO) has become a commonly used material with potential applications in a wide range of areas, such as catalysis, electronics, photonics, and sensing
Chu et al [11] proposed an improved method for fabricating a transparent porous alumina nanostructure; they formed it on a glass covered tin-doped indium oxide (ITO) substrate by the anodization of a sputtered aluminum (Al) layer
The AAO/ITO/glass structure was used to solve the problem of unreacted Al inside the AAO template, which reduces the average transmittance in the AAO/glass structure
Summary
Nanoporous anodic aluminum oxide (AAO) has become a commonly used material with potential applications in a wide range of areas, such as catalysis, electronics, photonics, and sensing Owing to their regular structures and narrow size distributions of pore diameters and interpore spacings, porous alumina membranes are used in the fabrication of nanometer-scale composites [1,2,3]. The AAO process is better than other conventional template fabrication methods, such as atomic layer deposition [7], focused ion-beam etching [8], and scanning probe-based nanolithography. Chu et al [11] proposed an improved method for fabricating a transparent porous alumina nanostructure; they formed it on a glass covered tin-doped indium oxide (ITO) substrate by the anodization of a sputtered aluminum (Al) layer. Posttreatment annealing reduces the density of defects that arise from the chemical anodic reaction and make the surface of the anodic alumina much denser and of higher quality
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