Abstract

The electronic characteristics, surface topography, and surface roughness of a Ti-3Cu alloy were investigated in phosphate buffered saline (PBS) containing bovine serum albumin (BSA) at 37 °C and pH 7.4 ± 0.2 by Mott-Schottky analysis (MSA) and atomic force microscopy (AFM). The n-type oxide layer was produced on the Ti-3Cu alloy surface due to the formation of oxygen-deficient TiO2-x barrier layer with interstitial copper as As the serum-protein concentration increased from 1 g/L to 6 g/L in the phosphate buffered saline, the donor densities (ND) of the semiconducting oxide layer decreased. The accumulation of serum protein observed by atomic force microscopy became the driving force in the restructuring of the oxide film via chemisorption and caused a reduction in the donor densities. The change in the magnitude of the nano-roughness suggested chemisorption which is beneficial for the osseointegration of Ti-3Cu implants.

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