Abstract
AbstractA high resolution resistometric measurement technique (HRRMT) is used to study electromigration (EM) in different Al-based metal lines. Instead of using a bridge-method, the high resolution is now obtained by performing experiments in a very stable temperature environment. The main advantage of this technique is that resistance variations are measured, due to processes that occur in the tested metal line only. During EM, both resistivity and geometrical variations can occur, both resulting in a resistance change. A new method is proposed in order to separate these two contributions on-line during the whole EM-experiment. It is shown that even at low current stress, geometrical changes are the main cause for the EM-induced resistance increase.
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