Abstract
Gallium oxide (Ga2O3) films have been deposited on SrTiO3 (100) substrates by using the metal-organic chemical vapor deposition (MOCVD) method. Post-deposition annealing was performed at different temperatures. XRD θ-2θ scans displayed that the annealing at 1000 °C leaded to β phase Ga2O3 film with the best crystalline quality. Microstructural and chemical composition analyses revealed that this film was single crystal β-Ga2O3 with stoichiometric ratio. The epitaxial relationships were clearly determined as β-Ga2O3 (100) || SrTiO3 (100) with β-Ga2O3 [001] || SrTiO3 <011>. All of the prepared Ga2O3 samples have average transmittances in the visible range of more than 70%.
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