Abstract
Deposition of silicon nitride films on by RF magnetron reactive sputtering of an elemental silicon target in a nitrogen/argon 1:1 plasma has been investigated. Deposition parameters, such as power density and total gas pressure, have been studied in relation to film atomic composition, oxygen contamination, stress, and the critical electric field. The refractive index, measured by ellipsometry, has been correlated to the film composition measured by nuclear reaction analysis. AES profiling of the interfaces after annealing (850°C) showed that magnetron sputtered silicon nitride films are suitable for encapsulation. Furthermore, preliminary electrical results of annealed materials showed that, under correct deposition parameters, critical fields as high as are readily attainable.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
