Abstract
Recently, the interest in ternary nitrides, e.g. (Ti,Al)N, (Ti,Zr)N etc., as wear resistant and decorative hard coatings is increasing. (Ti,Cr)N appears to be more corrosion resistant and to have a higher toughness than TiN. In order to obtain more information on these types of hard coatings, (Ti,Cr)N x films were deposited by reactive d.c. magnetron sputtering and by reactive ion plating using hollow cathode discharge low voltage electron beam evaporation. The films were characterized with respect to their chemical composition, morphology, structure, hardness, critical load, wear and friction, as well as their decorative and corrosive properties.
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