Abstract
ABSTRACTAn ultra-high vacuum chemical vapor deposition system using pulsed, supersonic jets of halogenated hydrocarbon precursors has been constructed with the intention of growing diamond thin films. Experimental results from this system should determine whether the hyperthermal activation of precursors improves the carbon incorporation efficiency of film growth. The jets, produced by commercially available pulsed valves, were characterized with a fast ionization gauge. Parameters such as valve backing pressure and the pulse width were varied to optimize material flux and avoid the formation of boundary layers above the substrate that could reduce the kinetic energy of the precursors.
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