Abstract
The formation of a silicon alloy has been achieved by electron beam irradiation of a nickel-silicon bilayer. This process, called SiDWEL1 , has been developed by Quantiscript. The nickel-silicon bilayer is very thin and the electron beam operates at low energy and current. Silicide formation occurred around the interaction volume of the electrons within the material. This paper describes the nature of the structures produced and the origin of the difficulties encountered with the characterization. The necessity of further analysis with TEM based techniques is highlighted.Figure 1 presents a cross-section of a typical sample. The growth of silicide grains is induced by the e-beam irradiation of the stack for few microseconds. Nucieation is initiated by the diffusion of silicon atoms in nickel grains, induced by the heating arising from the electron beam interaction with the solid. A new phase is revealed by FE-SEM observation, after wet etching of the nickel film, as shown in figures 2 and 3.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
