Abstract
Local order and composition of passive films formed on nickel and nickel molybdenum alloys have been studied by combining two in-situ techniques, ReflEXAFS and Raman Spectroscopy. Passive films can be described by a model consisting of NiO entities perpendicular to the electrode surface and separated by channels containing OH −, SO 4 = or water molecules. X-Ray reflection measurements show that the density of the passive films is four times lower than those of the bulk fcc NiO. It is deduced from the number of oxygen first neighbours that Mo enhances disorder in the passive film. Ex-situ ReflEXAFS measurements and RHEED observations show a recrystallization phenomenon which is accompanied by a thinning of the passive layer and a better ordering. It results that the density of the film is about fifty percent of NiO fcc. ReflEXAFS studies at the Mo k edge reveal an increase of the Mo concentration at the metal-film interface.
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