Abstract
Polymer-like cyclohexene thin films have been deposited on glass and silicon substrates at room temperature and 100 ◦C for analysis of their various properties using the plasma enhanced chemical vapor deposition (PECVD) method. Cyclohexene monomer was utilized as an organic precursor, and hydrogen and Ar were used as bubbler and carrier gases, respectively. In order to compare the influence of the electrical and the optical properties of the plasma-polymerized organic thin films with the deposition condition such as the RF power and deposition temperature. We analyzed the as-grown plasma-polymerized thin films using Fourier-transform infrared and ultraviolet-visible spectroscopy, and I-V and C-V curves. As the plasma power was increased, the ellipsometry and the ultraviolet-visible spectroscopy measurements should that the refractive index of thin films increased and the transmittance decreased. The minimum dielectric constant and the best leakage current were 2.43 and 7 × 10−12 A/cm, respectively. The contact angles also increased with increasing RF power.
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