Abstract

With the development of science and technology, field emission scanning electron microscope (FESEM) plays an important role in nano-material measurements because of its advantages of high magnification, high resolution and easy operation. A high-quality secondary electron image is a significant prerequisite for accurate and precise length measurements. In order to obtain high-quality secondary electron images, the conventional treatment method for non-conductive materials is coating conductive films with gold, carbon or platinum to reduce charging effects, but this method will cover real micro structures of materials, change the sample composition properties and meanwhile introduce a relatively big error to nano-scale microstructure measurements. This paper discusses how to reduce or eliminate the impact of charging effects on image quality to the greatest extent by changing working conditions, such as voltage, stage bias, scanning mode and so on without treatment of coating, to obtain real and high-quality microstructure information of materials.

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