Abstract
The chromium nitride thin lms have became more and more popular in the last years because of their very good physical, chemical and mechanical properties. The present study relates to thermal stability of hard thin lms of chromium nitride CrN, carried out physical vapour deposition. We studied the in uence of the annealing temperature on the morphology of CrN lms, deposited on silicon substrate using magnetron sputtering. The characterizations are examined using scanning electron microscope equipped with energy dispersive X-ray spectroscopy. Annealing treatments in N2 at 60
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