Abstract
By using a helium metastable atom beam and butanethiol (BT) self-assembled monolayers (SAM), the metastable atom lithography to the gold film on muscovite mica having a flat surface was carried out. Large-area intact and clean patterns with a nanoscale width of the edge, approximately 50–70 nm, were obtained. Meanwhile, we found that the shorter chain molecules like the BT can be used as resist and may result in sharper edge of patterns, but the roughness of gold patterns with the BT SAM is larger than that with the Octanethiol (OT) SAM and similar to that with the Dodecanethiol (DDT) SAM. This observation can be interpreted by the presence of the liquid phase in the short-chain homologues. All information indicated that the BT SAMs on atomically flat surfaces could be used as a resist for exposure to metastable atom beams.
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