Abstract
AbstractThe high‐temperature oxidation resistance property of MoSi2 coatings is strongly influenced by the chemical composition, density and structure of the deposit. The aim of this work is to determine the role of the deposition process in the microchemistry and microstructure of the coating. In order to achieve this task, we compare MoSi2 produced by LPPS (low‐pressure plasma spraying) and conventional APPS (atmospheric pressure plasma spraying) techniques with the aid of a complementary use of characterization methods such as SEM, EPMA (electron probe microanalysis), CMA (computer‐aided microanalysis), GDOS (glow discharge optical spectroscopy) and XPS. From the overall results it is evident that the application of plasma spraying under low pressure considerably improves MoSi2 layers. They are characterized by a higher density, with fewer pores and discontinuities, and have a more uniform chemical composition and a better coating‐substrate interface.
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