Abstract
We investigate excimer laser ablation of TiNi shape memory alloy thin sheets andfilms using an image projection system as a tool for micromachining and patterning.Characteristics of material removal by KrF excimer laser induced ablation at 248nm and the dependence of material removal rates on laser parameters such asfluence and pulse frequency are explored. Fluences at the workpiece using a10×projection lens were up to 2.5 J cm−2 with pulse repetition rates up to 100 Hz.Conventional chrome-on-quartz masks were used for pattern transfer. Materialremoval mechanisms and rates of material removal were investigated for thinfilm samples and thin sheet samples having thicknesses of 3 and 150 μ mrespectively.
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