Characterization of microcraters fabricated on the silicon surface by single and multi-pulse laser ablation at various laser intensities

Abstract

Microcraters on the silicon surface were fabricated with the help of a nanosecond pulsed laser. The features of microcraters fabricated with single laser pulse and pulse trains of various laser intensities were analyzed. In case of single pulse, the diameter and depth of micro-crater rise with the laser fluence and achieve saturation at higher laser intensities. For the range of fluence 62–122 J/cm2, the mass of ablated material was in the range of 0.27 × 10−9–2.69 × 10−9 g/pulse. Numerically simulated temperature trends were compared with the measured crater depths. The influence of laser intensity on the target temperature and onset time to melt/boil were also investigated. In case of pulse trains, the reduction in material removal efficiency is attributed to the plume shielding and accumulation of ablated material on the crater walls. We demonstrated that the laser intensity and number of laser pulses can be used to control the morphology of a microcrater.