Abstract
AbstractThe characterization of hydrogen in hydrogenated nano-crystalline silicon (nc-Si:H) films with various crystallinity has been studied using FTIR absorption spectroscopy and gas effusion spectroscopy. In gas effusion spectrum of a nc-Si:H, three evolution peaks of H2 are found near 400, 500 and 600°C. From the deconvolution of the gas effusion spectra, the hydrogen concentration in amorphous region dose not depend on the volume fraction of crystalline. The surface density of hydrogen at the interface and in the grain boundaries of nano-crystalline grains decreases with the volume fraction of crystalline. The properties of hydrogen in nc-Si:H films are discussed with the results of FTIR absorption spectroscopy.
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