Abstract
AbstractThe roughness of glass surfaces after different stages of etching is investigated by reflection measurements with a spectrophotometer, light scattering, atomic force microscopy (AFM, on a small scale) and profilometry (on a large scale). The results suggest that there are three regimes during etching, according to their optical reflectivity and roughness. The first and the second regimes are studied by the Kirchhoff theory and the third one is studied by the optical geometric theory. Also, the roughness obtained by optical scattering is compared with the AFM results. Copyright © 2005 John Wiley & Sons, Ltd.
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