Characterization of electron cyclotron resonance source plasma for etching and deposition

Abstract

An electron cyclotron resonance (ECR) system has been assembled and microwave plasma was studied in argon, oxygen, carbontetrafloride, and a mixture of oxygen and carbontetrafloride. A cylindrical Langmuir probe was used to measure the current and its variation with respect to input power (50–100 W), flow rates, probe position in the reactor and pressure. Plasma parameters like ion density N i, floating potential, electron temperature and plasma potential were estimated. Optimum operational parameters like input power, pressure and gas flow rate were also established.