Abstract
Chromium nitride and carbonitride hard coatings were deposited by organometallic chemical vapour deposition in the temperature range 350–550 °C. Bis(benzene) chromium and NH 3 or N 2H 4 were used as chromium and nitrogen vapour sources respectively. The chemical and structural characterization of these coatings is presented. Amorphous films were obtained below 450 °C. Above this temperature, a different phase, namely Cr 7C 3, Cr 2 (N,C) or CrN could be prepared depending on the gas phase composition. Electron probe microanalysis and X-ray photoelectron spectroscopy gave evidence for a slight contamination of the films with free carbon. The experimental results are in good agreement with a thermodynamic calculation which has been fruitful in giving information about the feasibility of growing chromium nitride phases under these chemical vapour deposition conditions. The microhardness of the coating in each case was comparable with that of similar material deposited by other techniques.
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