Abstract

The emission properties of tin plasmas, produced by the irradiation of preformed liquid tin targets by several-ns-long 2 µm-wavelength laser pulses, are studied in the extreme ultraviolet (EUV) regime. In a two-pulse scheme, a pre-pulse laser is first used to deform tin microdroplets into thin, extended disks before the main (2 µm) pulse creates the EUV-emitting plasma. Irradiating 30- to 300 µm-diameter targets with 2 µm laser pulses, we find that the efficiency in creating EUV light around 13.5 nm follows the fraction of laser light that overlaps with the target. Next, the effects of a change in 2 µm drive laser intensity (0.6–1.8 × 1011 W cm−2) and pulse duration (3.7–7.4 ns) are studied. It is found that the angular dependence of the emission of light within a 2% bandwidth around 13.5 nm and within the backward 2π hemisphere around the incoming laser beam is almost independent of intensity and duration of the 2 µm drive laser. With increasing target diameter, the emission in this 2% bandwidth becomes increasingly anisotropic, with a greater fraction of light being emitted into the hemisphere of the incoming laser beam. For direct comparison, a similar set of experiments is performed with a 1 µm-wavelength drive laser. Emission spectra, recorded in a 5.5–25.5 nm wavelength range, show significant self-absorption of light around 13.5 nm in the 1 µm case, while in the 2 µm case only an opacity-related broadening of the spectral feature at 13.5 nm is observed. This work demonstrates the enhanced capabilities and performance of 2 µm-driven plasmas produced from disk targets when compared to 1 µm-driven plasmas, providing strong motivation for the use of 2 µm lasers as drive lasers in future high-power sources of EUV light.

Highlights

  • Laser-produced plasmas containing highly charged tin ions are the light source of choice for state-of-the-art extreme ultraviolet (EUV) lithography [1,2,3,4,5,6,7,8,9,10,11]

  • We have studied plasmas produced from laser pre-pulse preformed liquid tin disk targets with diameters ranging 30–300 μm using 1- and 2 μm drive laser systems

  • For the 2 μm driver, the conversion efficiency of laser energy to EUV radiation closely follows the fraction of the laser energy absorbed by the tin target and CE values of up to 3% are obtained for the largest targets

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Summary

Introduction

Laser-produced plasmas containing highly charged tin ions are the light source of choice for state-of-the-art extreme ultraviolet (EUV) lithography [1,2,3,4,5,6,7,8,9,10,11]. Starting from mass-limited tin-microdroplets, a low intensity pre-pulse (PP) deforms the droplets into a shape better suited for interaction with a second high-intensity main pulse (MP), used to create the EUV-emitting plasma This twostep process is crucial for reaching source efficiencies and power levels that allow for the industrial utilization of EUV lithography [26,27,28,29]. The scaling of the here relevant inverse bremsstrahlung absorption coefficient kL ∝ λ2 n2e, with wavelength λ and electron density ne indicates that shorter wavelength light is absorbed less efficiently at equal plasma density but because of the higher critical electron density (nc ∝ λ−2), the shorter wavelength laser light can penetrate into denser plasma regions leading to an overall increased absorption of the laser light, with the absorption taking place in regions of higher emitter and absorber density This may benefit the obtainable source brightness but an associated increase in optical depth [32, 33] leads to increased broadening of spectral features outside the in-band region relevant for EUV lithography. Plasmas generated by 1- and 2 μm drive laser light are characterized and compared

Method
Target diameter
Laser intensity
Pulse duration
EUV generation using 1- and 2 μm laser light
Findings
Conclusions
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