Abstract
Characterization of (111)-Oriented Ag Nano-twinned Films on (111) Si Substrates
Highlights
The innovative concept of grain boundary engineering was proposed by Watanabe [1]
Our study showed that directly sputtering an Ag film with a thickness of greater than 2 μm on a Si substrate resulted in peeling failure of the Ag film
The cross-sectional microstructure of the nano-twins in the sputtered Ag films was further observed with TEM, and the crystal structure was identified by selected area diffraction (SAD) taken from the TEM specimens
Summary
The innovative concept of grain boundary engineering was proposed by Watanabe [1]. Twin boundaries have a coherent crystal structure with a Σ3 coincidence site lattice, which has an interfacial energy of only 5% of that of the conventional high angle grain boundaries [2]. Since a twin plane has a much lower energy than a Keywords: Nanotwin, Ag film, sputtering, (111) preferred orientation, (111) Si substrate. Our study showed that directly sputtering an Ag film with a thickness of greater than 2 μm on a Si substrate resulted in peeling failure of the Ag film.
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