Abstract

The article presents the results of studies of the mechanical and adhesive characteristics of α-Al2O3 coatings depositeedby reactive anodic evaporation of Al in an arc discharge at low-energy (50 eV) high-current (up to 15 mA·cm−2) ion assistance at 640°C. The coatings are characterized by a strong texture (300), which contributes to an increase in adhesive strength (the critical load at which the destruction of the coating is observed reaches 2560±29 mN). It was shown that there is an optimal discharge current (20 A), at which the best adhesion, the surface quality (Ra = 13.4 nm, Rz = 44.7 nm) and the resistance of elastic deformation of coatings (H/E = 0.08) are achieved.

Highlights

  • Alumina in acrystalline state has high performance, while the amorphous phase is characterized by low heat resistance and hardness [1]

  • The article presents the results of studies of the mechanical and adhesive characteristics of α-Al2O3 coatings depositeedby reactive anodic evaporation of Al in an arc discharge at low-energy (50 eV) high-current ion assistance at 640°C

  • The coatings are characterized by a strong texture (300), which contributes to an increase in adhesive strength

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Summary

Introduction

Alumina in acrystalline state has high performance, while the amorphous phase is characterized by low heat resistance and hardness [1]. The high migratory mobility of adatoms, which is necessary for the formation of nanocrystalline coatings at low temperatures, is achieved through an increase in the intensity of bombardment of the coating surface with ions with energies of 100–200 eV during its growth [8,9,10,11]. This leads, firstly, to growing intrinsic stresses in coatings and the deterioration of their adhesion [12], and secondly, to the reduction of the crystallite size [13] to values, at which the α-phase cannot be stabilized [14]. At the high-rate deposition of α-Al2O3 coatings, there is a need for an appropriate increase in intensity of ion assistance in order to maintain the required level of energy per atom in the coating [5]

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