Abstract

This study formed a hard TiAlSiWN coating layer using Ti, Al, Si and W raw powders that were mechanically alloyed and refined. The TiAlSi and TiAlSiW coating targets were fabricated using a pulse current activated sintering process in a short time with the optimal sintering conditions. The optimized sintering condition was obtained by controlling process parameters such as temperature, pressure, heating rate and pulse ratio (on/off). The coating targets were successfully deposited on the WC substrate to form the TiAlSiN and TiAlSiWN nitride nano-composite structures by an arc ion plating process and also, their coating layers were compared according to the addition of W element. The microstructures of the nitride nano-composite coating layer were analyzed, focusing on the distribution of the crystalline phases, amorphous phases (Si3N4), and growth orientation of the columnar crystal depending on the addition of W element. The mechanical properties of the coating layers were exhibited a hardness of approximately 3000 kg/mm2 and adhesion of about 117.77 N in the TiAlSiN. In particular, the TiAlSiWN showed excellent properties with a hardness of more than 4300 kg/mm2 and an adhesion of about 181.47 N, respectively.

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