Abstract
Microwave plasma chemical vapor deposition (MPCVD) system was used for exciting mixed reaction gases of methane and hydrogen to produce plasma sheath potential drop. It introduces an electric field to accelerate positive and lighter hydrogen ions (H(superscript +)) to etch out sp^2 clusters and amorphous carbons anisotropically. Besides, high-energy ions, hydrocarbon species and hydrogen atoms (H) are diffused to etch out sp^2 clusters and amorphous carbons isotropically. Without externally applying negative bias, nano-tip diamond-like carbon (DLC) film with a few nanosize diamonds and many sp^3 bonding was successfully deposited under the competition of etching and deposition. The DLC nano-tip growth mechanism is different from the general growth mechanism of carbon nano-tube. Raman spectrometer, X-ray photoelectron spectroscopy were used for confirming that the as-grown films were DLC ones. The field emission properties of nano-tip DLC films were studied using a diode structure.
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