Abstract
The bis(N-ethyl-5-methylsalicylaldimine)nickel(II) [Ni(5-me-saletN)2] complex was synthesized and characterized by elemental analyses, FT-IR, TG-DTA, mass spectrometry and vapour pressure measurement studies. The TG curve of the complex showed a single-step weight loss commencing from 490 K to nil residue at 600 K, without competing fragmentation step. The non-isothermal vaporization activation energy value determined by Coats-Redfern method yielded the value of 93.5 ± 7 kJmol–1. The dynamic TG run proved the complex to be completely volatile. And the equilibrium vapour pressure of the complex over the temperature range of 421 - 524 K, determined by the TG-based transpiration technique yielded the value of 94.2 ± 1.2 kJmol–1 for its standard enthalpy of vaporization . The entropy of vaporization was calculated from the intercept and found to be 249.4 ± 2.6 Jmol–1•K–1.
Highlights
Nickel films are widely used in the metallization of ferrites and as decorative and corrosion-resistant coatings
Chemical vapour deposition (CVD) for Ni or its alloy film has been widely investigated by researchers of microelectronics and nanotechnology, because chemical vapour deposition (CVD) is the method to deposit film with good-quality step coverage on patterned structures [3]-[5]
Ni precursor is tetracarbonylnickel(0) Ni(CO)4 [6], whose boiling point is 43 ̊C and volatility is very useful as a precursor
Summary
Nickel films are widely used in the metallization of ferrites and as decorative and corrosion-resistant coatings. This paper presents the development and characterization of bis(N-ethyl-5-methyl-salicylaldimine)nickel(II) volatile precursor of nickel. The polarity of the metal-oxygen bond responsible for the ionicity of the complex could be reduced by substituting nitrogen for oxygen in the carbonyl group (C=O) Based on these considerations, the second nickel complex bis(5-methyl-salicylaldimine)nickel(II), Ni(5-me-salim) was prepared and was subsequently characterized. The second nickel complex bis(5-methyl-salicylaldimine)nickel(II), Ni(5-me-salim) was prepared and was subsequently characterized At this juncture it was decided to substitute H of =NH as shown in (III) of Scheme 1 by the ethyl group, thereby. This complex was considered as an ideal precursor for the CVD of metallic nickel and further characterization as well as the vapour pressure measurements was deemed to be essential, as it is imperative to know the vapour pressure of the precursor for an accurate control of the feed rate to the CVD reactor
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