Abstract
YBa 2Cu 3O 7−y ramp-type Josephson junctions with PrBa 2Cu 3O 7−y and SrTiO 3 barriers have been fabricated on SrTiO 3 (001) substrates. The surface morphology of the ramp-edge was examined using the atomic force microscope (AFM). The conditions of the photlithography process and the ion beam incident angle were optimized to improve the surface roughness at the ramp-edge. Typically, smooth surfaces at the ramp-edge with a ramp edge of about 25° and an average roughness of about 3 nm was achieved. Results indicate the junction properties are improved with a smooth ramp-edge surface. The details are discussed.
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