Abstract
Etude par SIMS de l'orientation parallele a la surface du substrat (Au ou Si) de films de copolymere PS/PMMA de structure lamellaire resultant d'une localisation preferentielle du PS aux interfaces or/copolymere et air/copolymere et du PMMA a l'interface silicium/copolymere. La preparation de films dans des conditions d'evaporation lente de solvants qui solvatent preferentiellement un des composants entraine une orientation hors equilibre
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