Characteristics of RF reactive sputter-deposited Pt/SiO2/n-InGaN MOS Schottky diodes

Abstract

All RF sputtering-deposited Pt/SiO2/n-type indium gallium nitride (n-InGaN) metal–oxide–semiconductor (MOS) diodes were investigated before and after annealing at 400°C. By scanning electron microscopy (SEM), the thickness of Pt, SiO2,n-InGaN layer was measured to be ~250, 70, and 800nm, respectively. AFM results also show that the grains become a little bigger after annealing, the surface topography of the as-deposited film was smoother with the rms roughness of 1.67nm and had the slight increase of 1.92nm for annealed sample. Electrical properties of MOS diodes have been determined by using the current–voltage (I–V) and capacitance–voltage (C–V) measurements. The results showed that Schottky barrier height (SBH) increased slightly to 0.69eV (I–V) and 0.82eV (C–V) after annealing at 400°C for 15min in N2 ambient, compared to that of 0.67eV (I–V) and 0.79eV (C–V) for the as-deposited sample. There was the considerable improvement in the leakage current, dropped from 6.5×10−7A for the as-deposited to 1.4×10−7A for the 400°C-annealed one. The annealed MOS Schottky diode had shown the higher SBH, lower leakage current, smaller ideality factor (n), and denser microstructure. In addition to the SBH, n, and series resistance (Rs) determined by Cheungs׳ and Norde methods, other parameters for MOS diodes tested at room temperature were also calculated by C–V measurement.