Abstract
This paper describes some niobium thin-film point-contact Josephson junctions fabricated by magnetron sputtering and electron-beam lithography. The microwave-induced I-V step characteristics of a junction was expanded at a level of 1.9 mV, showing a step flatness of better than 1 ppm (2 nV) over a current span of 70 µA–the first time such flatness has been observed in thin-film weak links. The junctions are stable and withstand thermal cycling. The distribution of the critical current (Ic) and normal resistance (Rn) at 4.2 K is reported for 32 samples. The temperature dependence of the IcRn product was found to agree with the recent Kulik-Omelyanchuk theory of weak links, but some samples had IcRn products greater than those predicted by weak link theories.
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