Abstract
The CF, CF2 and CF3 radical densities and CHF3 molecule density were measured in a CHF3 electron cyclotron resonance (ECR) downstream plasma using infrared diode laser absorption spectroscopy (IRLAS). The intensities of emission lines F*, Ar* and Hα were also measured in a CHF3/3 % Ar ECR downstream plasma using optical emission spectroscopy (OES). These measurements were carried out as a function of the microwave power and the pressure with modulation of the power with an on-period of 15 ms and an off-period of 85 ms. On the basis of the results of IRLAS and OES measurements, the behaviors of the radicals in the ECR plasma have been investigated in detail.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
