Abstract
CH 4/ CF 4 mixture gas plasmas were studied by a heated double probe method (HDPM) and the relation among plasma states, chemical reaction in the plasma and the characteristics of deposited films was investigated. Electron temperature determined by HDPM had a sharp minimum at the flow rate ratio of CH 4/ CF 4 = 1.8. At high discharge current (200 mA), a hard carbon film with amorphous structure was formed on various kinds of substrates. From the plasma mass spectra, HF molecules were found to play an important role in the plasma reaction and a stoichiometric reaction model was proposed. The unusual variation of the electron temperature was discussed on the basis of the reaction model.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
