Abstract

In this study, an AlGaN/GaN high-electron-mobility transistor (HEMT) was grown through metal organic chemical vapor deposition on a Qromis Substrate Technology (QST). The GaN on the QST device exhibited a superior heat dissipation performance to the GaN on a Si device because of the higher thermal conductivity of the QST substrate. Thermal imaging analysis indicated that the temperature variation of the GaN on the QST device was 4.5 °C and that of the GaN on the Si device was 9.2 °C at a drain-to-source current (IDS) of 300 mA/mm following 50 s of operation. Compared with the GaN HEMT on the Si device, the GaN on the QST device exhibited a lower IDS degradation at high temperatures (17.5% at 400 K). The QST substrate is suitable for employment in different temperature environments because of its high thermal stability.

Highlights

  • GaN is widely used in high-frequency and high-power next-generation devices because of its two-dimensional electron gas (2DEG) concentration, high carrier mobility, low ON resistance, and high breakdown voltage [1,2,3]

  • Sapphire and Si are commonly used as substrate materials for GaN; their low thermal conductivity limits heat dissipation from device-level self-heating during the operation of high-electron-mobility transistors (HEMTs) and may influence the electrical characteristics, reliability, and performance of HEMTs [4,5,6]

  • The lattice mismatch in buffer layers is compensated with Fe and C doping, which causes the semi-insulating layer to increase the breakdown voltage and reduce the leakage current of the device

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Summary

Introduction

GaN is widely used in high-frequency and high-power next-generation devices because of its two-dimensional electron gas (2DEG) concentration, high carrier mobility, low ON resistance, and high breakdown voltage [1,2,3]. Sapphire and Si are commonly used as substrate materials for GaN; their low thermal conductivity limits heat dissipation from device-level self-heating during the operation of high-electron-mobility transistors (HEMTs) and may influence the electrical characteristics, reliability, and performance of HEMTs [4,5,6].

Results
Conclusion
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