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Abstract
Zirconium oxide (ZrO 2) films have been prepared by rf reactive magnetron sputtering at different O 2 concentrations in the mixture sputtering gases. The films have been characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), energy dispersive X-ray (EDX) and optical spectroscopies. The influence of O 2 concentration in the sputtering gases on the microstructure, residual stress and optical properties of the films has been studied. Also, the effect of loose packing structure caused by the high O 2 gas concentration on the deposition rate has been discussed.
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