Abstract
ABSTRACTIn this paper we report the growth of thin titanium oxide films on Si (100) and quartz at low temperatures (≤350°C) by photo-induced chemical vapor deposition (photo-CVD) with 222 nm UV radiation using a novel injection liquid source, which overcomes the reproducible problem in conventional bubblers. The properties of the films formed have been studied using ellipsometry, UV spectrophotometry and Fourier transform infrared spectroscopy (FTIR) measurements. Nanostructured films were observed by atomic force microscopy (AFM). It was found that crystalline TiO2films could be formed at deposition temperatures as low as 210°C by x-ray di ffraction (XRD). The influence of the deposition temperature on the film is discussed. The refractive index as high as 2.5 can be obtained at a deposition temperature of 350°C, while an optical transmittance of between 80-95% in the visible region of the spectrum was obtained at different deposition temperatures. Physical and optical characterization both reveal good film qualities, rendering this technique promising for a wide range of industrial application in low temperature microelectronic and optoelectronic material processing as well as for many heat sensitive compounds.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
