Characterisation of thin SiOx-layers on float glass deposited by Combustion Chemical Vapour Deposition (C-CVD)

Abstract

Float glass is not an inert material with non-improvable chemical durability as often perceived. Its corrosion starts whenever it becomes exposed to humidity. This process begins already immediately after production. In this paper we will demonstrate that the initial stage of float glass corrosion – ion diffusion (especially Na+) to the glass surface – can be inhibited by depositing silicon oxide layers (SiOx) of approximately 50nm thickness on the float glass surface using an atmospheric pressure coating method: Combustion Chemical Vapour Deposition (C-CVD).