Abstract

900 nanometre thick aluminium strips were produced by the Target Fabrication Group for an experiment at the Central Laser Facility. They were specified to be supported horizontally at either end across an 800 micron void and to be 500 microns in height. The production method used a Parylene (C8H8) supporting layer which was removed by oxygen plasma etching. This process resulted in a problematic contaminant layer that caused substantial increase to the absorption of X-rays in the laser campaign. The contaminant layer was characterised by optical microscopy and Scanning Electron Microscopy. Energy Dispersive X-ray Spectroscopy was able to detect a high relative abundance of carbon and oxygen in the plastic etched strips when compared to control samples. It has been shown that partially etched Parylene can form carboxylic groups with a ratio of 4:1 carbon to oxygen atoms. This effect was observed and exacerbated by the sample geometry not in sufficient contact with the grounded chamber baseplate causing charging and therefore insufficient hydrogen abstraction in the plasma. An alternative production method produced strips that were not as flat over the open area as the previous method but had no significant contaminant layer. This process involved coating a release layer of sodium chloride before the aluminium strips. When lowered into water, the salt dissolves in water and the strips are suspended on the surface tension, allowing the strips to be picked onto the mount. Each target required measuring for form using a white light interferometer where around half were within specification.

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