Abstract
We analysed the electronic and optical properties of oxygen-related striations in n-type Czochralski silicon wafers that underwent polysilicon contact process using deep level transient spectroscopy and micro-photoluminescence. Band to band micro-photoluminescence spectra measured at low temperature (80 K) indicate that the dark striations with low lifetime originate from nano-scale oxygen precipitates. Deep level transient spectroscopy results indicate that such nano-scale precipitates cannot be considered as point defects and analysed with Shockley-Read-Hall recombination statistics, but must be treated as extended defects with a continuous spectrum of energies.
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