Abstract
Electrochromic system is the one of the most popular devices using color memory effect under the influence of an applied voltage. The electrochromic system was produced based on the thin WO<sub>3</sub> electrochromic films. Films were prepared by RF magnetron sputtering from tungsten targets in a reactive Ar+O<sub>2</sub> gas atmosphere of various Ar/O<sub>2</sub> ratios. The technological gas mixture pressure was 3 Pa and process temperature 30°C. Structural and optical properties of WO<sub>3</sub> films were investigated for as-deposited and heat treated samples at temperature range from 350°C to 450°C in air. The material revealed the dependence of properties on preparation conditions and on post-deposition heat treatment. Main parameters of thin WO<sub>3</sub> films: thickness d, refractive index n, extinction coefficient k and energy gap Eg were determined and optimized for application in electrochromic system. The main components of the system were glass plate with transparent conducting oxides, electrolyte, and glass plate with transparent conducting oxides and WO<sub>3</sub> layer. The optical properties of the system were investigated when a voltage was applied across it. The electrochromic cell revealed the controllable transmittance depended on the operation voltage.
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