Abstract
This chapter discusses the ion-bombardment-induced composition changes in alloys and compounds. The aim of any ion-implantation experiment is to produce a material containing at least two components. For very low implantation fluences, the depth distribution of the implanted species is given simply by the range distribution in the implantation target. For somewhat larger doses, surface erosion by sputtering must be taken into account. As the implantation proceeds, some of the implanted material is eroded away, together with the substrate, and sputtering will, hence, limit the obtainable concentrations. In spite of the vast amount of literature on preferential sputtering, it is difficult to establish experimental proof of the mere existence of preferential sputtering, let alone to confirm the various proposed mechanisms. This confusion is caused by a large number of effects, some aspects of which may readily be attributed to preferential sputtering.
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