Abstract
Tungsten oxide films are widely studied for their use as the active layer in electrochromic devices. This chapter presents the results of investigations into the charge capacity and solar optical modulation of WO3 films deposited by reactive RF magnetron sputtering at different substrate temperatures (100–450°C) on both indium tin oxide (ITO) and fluorine-doped tin oxide (SnO2:F) coated glass substrates. Charge capacity is observed to decrease with increased deposition temperature for both H+ and Li+ intercalation. Upon charge insertion, reflectance modulation is observed for WO3 films prepared at > 250°C and the degree of modulation is a maximum for films prepared at 400°C. The results provide useful guidelines for the design of electrochromic (EC) devices employing either amorphous or crystalline tungsten oxide working electrodes.
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