Abstract

The dechanneling process of electrons in silicon single crystals has been studied at the Mainz Microtron MAMI for (110)-planar channeling of electrons at beam energies between 195 and 855 MeV. Dechanneling lengths were derived from a high and a low energy loss signal of the electrons which were recorded as function of the crystal orientation with respect to the beam direction for various crystal thicknesses in the range between 14.7 µm and 467 µm. The high energy loss signal corresponds to an energy loss of about 75 % of the total electron energy by emission of a bremsstrahlung photon, while the low energy signal to an energy loss of 0.7-1.7 % by emission of channelling radiation. While the high energy signal saturates as function of the crystal thickness, the low energy signal does not. The nearly constant dechanneling length of about 35 µm, as extracted from the high energy signal, is interpreted to originate from a small fraction of electron which initially occupy deeply bound quantum states.

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