Abstract
An optical channel waveguide array coupled to a charge-coupled device (CCD) linear imaging array and integrated onto the same silicon substrate has been fabricated and successfully operated. The channel waveguide array is formed by preferential-etching of V-grooves in the 100 plane of silicon.1 The integrated device differs from slab waveguide-CCD structures2,3 in that the present structure is configured such that an individual channel waveguide is coupled to each array element of the CCD image sensor. The channel waveguide structure thus provides a method for parallel injection of signals into a CCD which eliminates crosstalk due to capacitive coupling associated with high frequency electrical signal injection and which provides greater channel isolation and channel density than a comparable bulk optical wave structure.4
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