Abstract
An analytical 2D model of subthreshold current (IDSsub), subthreshold swing (Ssub), and threshold voltage (VTH) roll-off with a variation of channel doping concentration (NA) for symmetric double gate (DG) metal-oxide-semiconductor field-effect transistor (MOSFET) is presented. First of all, the channel potential is obtained by solving the 2D Poisson's equation with the help of the evanescent method. Based on the obtained channel potential, IDSsub, Ssub, and VTH roll-off expressions are derived in the analytical model. It is shown that the subthreshold characteristics predicted by the analytical model are in good agreement with commercially available 2D numerical simulation results for different channel length (L), channel film thickness (tsi), gate oxide (tox), and NA.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.