Challenges Of Thin Layers For SOFC Devices: From Low-Cost Chemical Bath Deposition (CBD) to Atomic Layer Deposition (ALD)

Abstract

Nowadays, it is clear that thin layers play a fundamental role in the development of a new generation of SOFC (solid oxide fuel cell) and more specifically when operating at lower temperatures ≤ 700°C. According to the role and specification of the thin layers, different deposition techniques can be adopted. A relatively sophisticated technique, Atomic Layer Deposition (ALD) and a cheaper one, Chemical Bath Deposition (CBD), are presented and compared in the specific case of thin layers of yttria-doped ceria (YDC) which can play the role of electrolyte, interfacial layer or catalyst in SOFC devices. High-quality ALD-processed YDC thin layers, with interesting properties, are obtained. The feasibility of YDC thin layers is evidenced by CBD, but further optimization is required for obtaining deposits more adherent and without cracks.