Challenges in Chemical Vapour Deposition of Graphene on Metallurgical Alloys Exemplified for NiTi Shape Memory Alloys

Abstract

Atomically-thin two-dimensional (2D) materials like graphene have been suggested as ultimately thin corrosion barriers and functional coatings for modern metallurgical alloys. The challenges of chemical vapour deposition (CVD) of such 2D materials, particularly graphene, on modern metallurgical alloys are discussed and reviewed here, focusing on the key problems with the metallurgical alloys’ often limited catalytic activity towards 2D materials growth and the key need to preserve the metallurgical alloys’ bulk properties during the high temperature 2D materials CVD processes. Using graphene CVD on NiTi (Nitinol) shape memory alloys as a case study, we illustrate the constraints arising from low catalytic activity and tendency to form oxides due the Ti in the NiTi alloy in terms of graphene growth results. We show that, by using a scalable low-temperature CVD process at 650 to 750 °C, we can deposit fully covering carbon films on the NiTi, albeit at limited structural quality. Notably, we also demonstrate that our CVD process does not degrade the bulk microstructure of the NiTi during carbon deposition and, importantly, leaves the crystallographic shape memory effect evolution intact. This underscores the potential of CVD for depositing graphene films on NiTi alloys while emphasizing the necessity for further exploration of CVD conditions to achieve high-quality graphene deposits akin to those on prior widely investigated dedicated (often sacrificial) high-purity metal substrates such as Ni.