Abstract

Since the first demonstration of (Al, In, Ga)N-based blue vertical-cavity surface-emitting lasers (VCSELs) in 2008, the maximum output power (Pmax) and threshold current density (Jth) has been improved significantly after a decade of technology advancements. This article reviewed the key challenges for the realization of VCSELs with III-nitride materials, such as inherent polarization effects, difficulties in distributed Bragg’s reflectors (DBR) fabrication for a resonant cavity, and the anti-guiding effect due to the deposited dielectrics current aperture. The significant tensile strain between AlN and GaN hampered the intuitive cavity design with two epitaxial DBRs from arsenide-based VCSELs. Therefore, many alternative cavity structures and processing technologies were developed; for example, lattice-matched AlInN/GaN DBR, nano-porous DBR, or double dielectric DBRs via various overgrowth or film transfer processing strategies. The anti-guiding effect was overcome by integrating a fully planar or slightly convex DBR as one of the reflectors. Special designs to limit the emission polarization in a circular aperture were also summarized. Growing VCSELs on low-symmetry non-polar and semipolar planes discriminates the optical gain along different crystal orientations. A deliberately designed high-contrast grating could differentiate the reflectivity between the transverse-electric field and transverse-magnetic field, which restricts the lasing mode to be the one with the higher reflectivity. In the future, the III-nitride based VCSEL shall keep advancing in total power, applicable spectral region, and ultra-low threshold pumping density with the novel device structure design and processing technologies.

Highlights

  • Since the first demonstration of (Al, In, Ga)N-based blue vertical-cavity surface-emitting lasers (VCSELs) in 2008, the maximum output power (Pmax ) and threshold current density (Jth ) has been improved significantly after a decade of technology advancements

  • Later in 900 s, the development of low threading dislocation GaN substrates further boosted the performance of nitride-based laser diodes (LD) [4,5,6,7]

  • Pumped III-nitride VCSELs were firstly demonstrated by NCTU and Nichia Corp., Tokushima, Japan, with different device configurations in 2008, which was more than a decade later than the edge-emitting lasers (EEL) [11,12]

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Summary

Introduction

(Al,Ga,In)N-based laser diodes (LD) have been used in optical storage, signage, projector display, industrial manufacturing, and many other applications. Representative device structures such as reflector types, cavity lengths, and aperture design were summarized in.

Category of III-Nitride VCSELs
Novel Carrier Aperture Designs
Polarization Control of III-Nitride VCSEL
Findings
Outlook of III-Nitride VCSEL Research
Full Text
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